AST-VCSEL
VCSEL Optical Aperture (OA) Metrology System
The VCSEL OA Metrology System delivers high-precision optical measurements for VCSEL (Vertical-Cavity Surface-Emitting Laser) aperture metrology. This advanced system provides precise measurements of the VCSEL oxide layer optical aperture utilizing AST’s advanced infrared imaging and contrast enhancement technology, enabling manufacturers to achieve tighter process control and higher product quality and performance.
Product Highlights
The VCSEL OA Metrology System provides advanced measurement capability to execute critical inspection criteria utilizing advanced imaging technology with precise automation to measure VCSEL aperture dimensions with exceptional accuracy and repeatability. The system features multi-spectral capabilities that allow for comprehensive inspection across visible, NIR, and SWIR wavelengths, capturing detailed data on aperture geometry, position, and uniformity.
- Precise measurements of VCSEL oxide layer optical aperture
- Advanced pattern recognition for precise aperture identification
- Automated & programmable illumination & wavelength selection for optimum edge contrast
- Comprehensive data analysis and reporting capabilities
- Advanced IR imaging technology – visible through NIR (400-1050nm)
- Capability to expand IR imaging technology using SWIR (900nm-1700nm)
- Fully automated wafer handling configurations supporting wafers from 50mm to 200mm with options supporting up to 300mm
Applications
- VCSEL aperture diameter, roundness, ratio, & chord metrology
- Dual & multi-aperture array alignment verification
- OA inspection using AI defect detection
- Process variation monitoring and control
- Critical dimension metrology for VCSEL manufacturing
- Quality assurance in high-volume production environments
- Research and development of next-generation VCSEL devices
Full Specifications
- Precise Measurements of VCSEL Oxide Layer Optical Aperture (OA)
- Optical Contrast Enhancement: Recipe Selectable Narrow Bandpass Filters
- Digital Contrast Enhancement: Recipe Control of Contrast w/ Histogram
- Advanced Infrared Imaging Technology:
- Standard: Visible Though NIR (400-1050nm)
- Optional: SWIR (900nm-1700nm)
- Automated & Programmable Illumination, Wavelength Selection, Aperture Diaphragm, and Camera Exposure / Gain ensures best QA Edge Contrast and Repeatability
- Advanced Vision Tool Library for Executing Optimized OA Focus, Pattern Find, and Geometric Measurements
- 300mm x 300mm X-Y Travel
- 100mm Z-axis Travel
- ISO 5 (Class 100) Cleanroom Compatible
- ISO 4 (Class 10) Cleanroom Option
- Semi S2 / S8 Protocol Compliant
- Light Tower for System Status
- ScopeViewer3 Software Application Suite
- Flexible Part-Programming
- Advanced Vision Tools & Metrology Features
- SECS-GEM factory Interface
- Full Recipe Control of all Imaging Functions
- Recipe Generation in Python Layer
- Flexible Configuration for Long Term Support of Hardware and Software Components
- Automated, High-Resolution Optical System
- 5X, 10X, 20X, 50X, & 100X BF IR Objectives
- Optional BF/DF Objectives for NIR
- Can mix NIR & BF/DF Obj. on Turret
- Broadband or LED Light Source
- Standard Video Auto-Focus
- Optional Tracking Laser Auto-Focus
- System can be configured with or without wafer loader
- Standard: Supports 50mm to 200mm wafers Open Cassette
- Optional: SMIF, FOUP, 300mm Wafers, Film Frame, Etc.
Contact Sales
Our metrology systems can be fully customized to meet your requirements. If you have questions about our product offerings or capabilities, please contact us for more information.